OPTIMIZATION AND THERMODYNAMIC CHARACTERISTICS OF COPPER CORROSION INHIBITION BY EXPIRED TOPLEX SYRUP IN SULFURIC ACID
DOI:
https://doi.org/10.59957/jctm.v61.i3.2026.7Keywords:
Toplex Syrup, Copper, Sulfuric Acid, Corrosion Inhibition, Thermodynamic parameters, Response Surface Methodology (RSM), Scanning Electron Microscopy (SEM)Abstract
This study investigates the effectiveness of expired Toplex syrup as a sustainable and eco-friendly corrosion inhibitor for copper in 0.5 M sulfuric acid (H2SO4), using weight loss measurements to assess its performance. The influence of critical parameters inhibitor concentration (0.1 - 0.4 % v/v), temperature (293 - 323 K), and immersion time (0.5 - 1.5 h)-on corrosion rate and inhibition efficiency were comprehensively examined. Experimental results revealed a direct correlation between inhibition efficiency and both Toplex concentration and temperature, with peak efficiency (95.55 %) was achieved at 0.385 % v/v, 322.5 K, and 1 h of immersion. Optimization using Response Surface Methodology (RSM) with a central composite design yielded a statistically robust and predictive model (R2 = 0.994, Q2 = 0.946). Adsorption behaviour followed both the Langmuir and Temkin isotherms, while thermodynamic analysis confirmed a spontaneous physisorption mechanism, as evidenced by negative Gibbs free energy values (ΔGads = - 11.69 to - 17.46 kJ mol−1). Activation energy calculations indicated an endothermic corrosion process, with significantly higher energy barriers observed in the presence of the inhibitor supporting a predominantly physical adsorption mechanism. Furthermore, Scanning Electron Microscopy (SEM) revealed the formation of a uniform and protective film on the copper surface, confirming the role of Toplex syrup in mitigating
acid-induced degradation. These findings highlight the potential of expired Toplex syrup as an effective, low-cost, and environmentally benign corrosion inhibitor for copper in acidic environments, with promising implications for industrial applications.
Downloads
Published
Issue
Section
License
Copyright (c) 2026 Journal of Chemical Technology and Metallurgy

This work is licensed under a Creative Commons Attribution-NonCommercial 4.0 International License.